Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication
Crossref DOI link: https://doi.org/10.1038/srep29625
Published Online: 2016-07-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yang, Po-Shuan
Cheng, Po-Hsien
Kao, C. Robert
Chen, Miin-Jang
Text and Data Mining valid from 2016-07-12
Version of Record valid from 2016-07-12
Article History
Received: 8 March 2016
Accepted: 22 June 2016
First Online: 12 July 2016
Competing interests
: The authors declare no competing financial interests.