High-speed maskless nanolithography with visible light based on photothermal localization
Crossref DOI link: https://doi.org/10.1038/srep43892
Published Online: 2017-03-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wei, Jingsong
Zhang, Kui
Wei, Tao
Wang, Yang
Wu, Yiqun
Xiao, Mufei
Text and Data Mining valid from 2017-03-02
Version of Record valid from 2017-03-02
Article History
Received: 21 November 2016
Accepted: 30 January 2017
First Online: 2 March 2017
Competing interests
: The authors declare no competing financial interests.