Atabaki, Amir H.
Moazeni, Sajjad
Pavanello, Fabio
Gevorgyan, Hayk
Notaros, Jelena
Alloatti, Luca
Wade, Mark T.
Sun, Chen
Kruger, Seth A.
Meng, Huaiyu
Al Qubaisi, Kenaish
Wang, Imbert
Zhang, Bohan
Khilo, Anatol
Baiocco, Christopher V.
Popović, Miloš A.
Stojanović, Vladimir M.
Ram, Rajeev J.
Article History
Received: 5 October 2017
Accepted: 19 February 2018
First Online: 18 April 2018
Change Date: 21 June 2018
Change Type: Correction
Change Details: In this Letter, owing to an error during the production process, the author affiliations were listed incorrectly. Affiliation number 5 (Colleges of Nanoscale Science and Engineering, State University of New York (SUNY)) was repeated, and affiliation numbers 6–8 were incorrect. In addition, the phrase “two oxide thickness variants” should have been “two gate oxide thickness variants”. These errors have all been corrected online.
Competing interests
: C.S., M.T.W., R.J.R., M.A.P. and V.M.S. are involved in developing silicon photonic technologies at Ayar Labs.