Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
Crossref DOI link: https://doi.org/10.1038/s41598-017-01099-3
Published Online: 2017-04-19
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ma, Donghan
Zhao, Yuxuan
Zeng, Lijiang
Text and Data Mining valid from 2017-04-19
Version of Record valid from 2017-04-19
Article History
Received: 26 January 2017
Accepted: 21 March 2017
First Online: 19 April 2017
Competing Interests
: The authors declare that they have no competing interests.