Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation
Crossref DOI link: https://doi.org/10.1038/s41598-017-04222-6
Published Online: 2017-06-20
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Bong Ho
Gu, Hyun Ho
Yoon, Young Joon
Text and Data Mining valid from 2017-06-20
Version of Record valid from 2017-06-20
Article History
Received: 22 February 2017
Accepted: 10 May 2017
First Online: 20 June 2017
Competing Interests
: The authors declare that they have no competing interests.