A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices
Crossref DOI link: https://doi.org/10.1038/s41598-017-04342-z
Published Online: 2017-06-21
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhang, Han
Yan, Qiuping
Xu, Qingyu
Xiao, Changshi
Liang, Xuelei
Text and Data Mining valid from 2017-06-21
Version of Record valid from 2017-06-21
Article History
Received: 9 March 2017
Accepted: 10 May 2017
First Online: 21 June 2017
Competing Interests
: The authors declare that they have no competing interests.