Tensilely Strained Ge Films on Si Substrates Created by Physical Vapor Deposition of Solid Sources
Crossref DOI link: https://doi.org/10.1038/s41598-018-35224-7
Published Online: 2018-11-13
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Li, Yize Stephanie
Nguyen, John
Text and Data Mining valid from 2018-11-13
Version of Record valid from 2018-11-13
Article History
Received: 8 August 2018
Accepted: 28 October 2018
First Online: 13 November 2018
Competing Interests
: The authors declare no competing interests.