High mobility Si0.15Ge0.85 growth by using the molten target sputtering (MTS) within heteroepitaxy framework
Crossref DOI link: https://doi.org/10.1038/s41598-019-47723-2
Published Online: 2019-08-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Hyun Jung
Text and Data Mining valid from 2019-08-09
Version of Record valid from 2019-08-09
Article History
Received: 19 June 2018
Accepted: 18 July 2019
First Online: 9 August 2019
Competing Interests
: The authors declare no competing interests.