Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition
Crossref DOI link: https://doi.org/10.1038/s41598-023-30376-7
Published Online: 2023-03-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Takakura, Ryo
Murakami, Seigo
Watanabe, Kaname
Takigawa, Ryo
Text and Data Mining valid from 2023-03-03
Version of Record valid from 2023-03-03
Article History
Received: 11 October 2022
Accepted: 21 February 2023
First Online: 3 March 2023
Competing interests
: The authors declare no competing interests.