Pushing the resolution of photolithography down to 15nm by surface plasmon interference
Crossref DOI link: https://doi.org/10.1038/srep05618
Published Online: 2014-07-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Dong, Jianjie
Liu, Juan
Kang, Guoguo
Xie, Jinghui
Wang, Yongtian
Text and Data Mining valid from 2014-07-08
Version of Record valid from 2014-07-08
Article History
Received: 2 April 2014
Accepted: 20 June 2014
First Online: 8 July 2014
Competing interests
: The authors declare no competing financial interests.