Beyond EUV lithography: a comparative study of efficient photoresists' performance
Crossref DOI link: https://doi.org/10.1038/srep09235
Published Online: 2015-03-18
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Mojarad, Nassir
Gobrecht, Jens
Ekinci, Yasin
Text and Data Mining valid from 2015-03-18
Version of Record valid from 2015-03-18
Article History
Received: 1 September 2014
Accepted: 24 February 2015
First Online: 18 March 2015
Competing interests
: The authors declare no competing financial interests.