Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays
Crossref DOI link: https://doi.org/10.1038/srep23823
Published Online: 2016-03-30
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Park, Woongkyu
Rhie, Jiyeah
Kim, Na Yeon
Hong, Seunghun
Kim, Dai-Sik
Text and Data Mining valid from 2016-03-30
Version of Record valid from 2016-03-30
Article History
Received: 1 December 2015
Accepted: 15 March 2016
First Online: 30 March 2016
Competing interests
: The authors declare no competing financial interests.