A novel approach of chemical mechanical polishing for cadmium zinc telluride wafers
Crossref DOI link: https://doi.org/10.1038/srep26891
Published Online: 2016-05-26
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhang, Zhenyu
Wang, Bo
Zhou, Ping
Kang, Renke
Zhang, Bi
Guo, Dongming
Text and Data Mining valid from 2016-05-26
Version of Record valid from 2016-05-26
Article History
Received: 23 March 2016
Accepted: 10 May 2016
First Online: 26 May 2016
Competing interests
: The authors declare no competing financial interests.