Resolution enhancement using plasmonic metamask for wafer-scale photolithography in the far field
Crossref DOI link: https://doi.org/10.1038/srep30476
Published Online: 2016-07-26
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Baek, Seunghwa
Kang, Gumin
Kang, Min
Lee, Chang-Won
Kim, Kyoungsik
Text and Data Mining valid from 2016-07-26
Version of Record valid from 2016-07-26
Article History
Received: 18 May 2016
Accepted: 5 July 2016
First Online: 26 July 2016
Competing interests
: The authors declare no competing financial interests.