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Polyphenol derivatives of porphyrins containing fluorene units: Synthesis and positive-tone photoresists for 22-nanometer lithography

Published Online: 2016-07-14

Published Print: 2016-06

Authors

Vainer, A. Ya.

Dyumaev, K. M.

Kovalenko, A. M.

Babuskin, Ya. L.

Krichevskaya, S. A.

Lubenskii, G. R.
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Text and Data Mining valid from 2016-06-01

Version of Record valid from 2016-06-01
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Article History

Received: 26 January 2016

First Online: 14 July 2016

Document is current