A Decisive Role of Si and Ge Energy Levels in the Process of Pore Formation during Electrochemical Etching in Hydrofluoric Acid Solutions
Crossref DOI link: https://doi.org/10.1134/S001250082011004X
Published Online: 2021-02-13
Published Print: 2020-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Khort, A. M.
Yakovenko, A. G.
Dementeva, A. A.
Syrov, Yu. V.
Sigov, A. S.
Text and Data Mining valid from 2020-11-01
Version of Record valid from 2020-11-01
Article History
Received: 13 March 2020
Revised: 15 October 2020
Accepted: 26 October 2020
First Online: 13 February 2021