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Synthesis of SiCNO:H Dielectric Layers by Plasma-Enhanced Chemical Vapor Deposition Using a Novel Organosilicon Precursor

Published Online: 2026-03-02

Published Print: 2026-02

Authors

Ermakova, E. N.

Kosinova, M. L.
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Text and Data Mining valid from 2026-02-01

Version of Record valid from 2026-02-01
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Article History

Received: 26 August 2025

Revised: 13 October 2025

Accepted: 14 October 2025

First Online: 2 March 2026

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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