Nanopore formation during electrolytic etching of silicon in hydrofluoric acid solutions
Crossref DOI link: https://doi.org/10.1134/S0020168515080014
Published Online: 2015-07-07
Published Print: 2015-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Abramova, E. N.
Khort, A. M.
Yakovenko, A. G.
Shvets, V. I.
Text and Data Mining valid from 2015-07-07