The Influence of the Power Supply of a Magnetron Sputtering System on the Properties of the Deposited TiO2 Films
Crossref DOI link: https://doi.org/10.1134/S0020168518150025
Published Online: 2019-01-17
Published Print: 2018-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Abramov, N. F.
Bezrukov, A. V.
Vol’pyan, O. D.
Obod, Yu. A.
Text and Data Mining valid from 2018-12-01
Article History
Received: 12 June 2016
First Online: 17 January 2019