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Effect of High-Temperature Annealing in Oxygen on the Properties of Hafnium Oxide Films Grown by Atomic Layer Deposition

Published Online: 2025-03-10

Published Print: 2024-05

Authors

Bulyarskiy, S. V.

Litvinova, K. I.

Shibalova, A. A.
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Text and Data Mining valid from 2024-05-01

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Article History

Received: 17 August 2023

Revised: 19 January 2024

Accepted: 19 January 2024

First Online: 10 March 2025

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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