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Structure of Hf0.9La0.1O2 Ferroelectric Films Obtained by the Atomic Layer Deposition

Crossref DOI link: https://doi.org/10.1134/S0021364019020115

Published Online: 2019-04-22

Published Print: 2019-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Perevalov, T. V.

Gritsenko, V. A.

Gutakovskii, A. K.

Prosvirin, I. P.
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Text and Data Mining valid from 2019-01-01
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Article History

Received: 21 November 2018

Revised: 21 November 2018

Accepted: 23 November 2018

First Online: 22 April 2019