Phase composition of thin silicon carbonitride films obtained by plazma endanced chemical vapour deposition using organosilicon compounds
Crossref DOI link: https://doi.org/10.1134/S0022476615010229
Published Online: 2015-03-25
Published Print: 2015-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fainer, N. I.
Kosyakov, V. I.
Text and Data Mining valid from 2015-01-01
