Document is current

Any future updates will be listed below

Structure, composition, and electrical resistance of thin ruthenium metallic layers obtained by pulsed chemical vapor deposition

Crossref DOI link: https://doi.org/10.1134/S0022476617080091

Published Online: 2018-02-01

Published Print: 2017-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

About CrossMark