COMPOSITION, STRUCTURE, AND FUNCTIONAL PROPERTIES OF THIN SILICON NITRIDE FILMS GROWN BY ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS (REVIEW OF 25 YEARS OF RESEARCH)
Crossref DOI link: https://doi.org/10.1134/S0022476622070022
Published Online: 2022-07-28
Published Print: 2022-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Vasiliev, V. Yu.
Text and Data Mining valid from 2022-07-01
Version of Record valid from 2022-07-01
Article History
Received: 13 January 2022
Revised: 29 January 2022
Accepted: 3 February 2022
First Online: 28 July 2022
CONFLICT OF INTERESTS
: The authors declares that he has have no conflicts of interests.