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The Determining Role of the (HF2)– Ion in the Formation of Pores in Silicon in Its Electrochemical Etching with Hydrofluoric Acid Solutions

Published Online: 2018-09-28

Published Print: 2018-09

Authors

Abramova, E. N.

Khort, A. M.

Yakovenko, A. G.

Slipchenko, E. A.

Kornilova, D. S.

Tsygankova, M. V.

Shvets, V. I.
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Text and Data Mining valid from 2018-09-01

Version of Record valid from 2018-09-01
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Article History

Received: 1 June 2017

First Online: 28 September 2018

Document is current