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Atomic Layer Deposition of AlMoxOy Films Using Aluminum Trichloride or Trimethylaluminum and Quantum-Chemical Calculations of Growth, Reduction, and Conversion Processes

Crossref DOI link: https://doi.org/10.1134/S0036023625602855

Published Online: 2026-01-16

Published Print: 2025-10

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Gadzhimuradov, S. G.

Etmisheva, S. S.

Maksumova, A. M.

Suleymanov, S. I.

Abdulagatov, I. M.

Abdulagatov, A. I.
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Text and Data Mining valid from 2025-10-01

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Article History

Received: 27 May 2025

Revised: 17 July 2025

Accepted: 18 July 2025

First Online: 16 January 2026

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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