Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System
Crossref DOI link: https://doi.org/10.1134/S0040579519060162
Published Online: 2019-12-16
Published Print: 2019-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yangmin Zhou,
Hou, Yanqing
Nie, Zhifeng
Xie, Gang
Ma, Wenhui
Dai, Yongnian
Ramachandran, Palghat A.
Text and Data Mining valid from 2019-11-01
Version of Record valid from 2019-11-01
Article History
Received: 18 August 2016
Revised: 8 June 2018
Accepted: 5 July 2018
First Online: 16 December 2019