Plasma-chemical treatment effect observed during the fabrication of AlGaN/GaN devices
Crossref DOI link: https://doi.org/10.1134/S1027451015040084
Published Online: 2015-08-06
Published Print: 2015-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Enisherlova, K. L.
Kulikauskas, V. S.
Seidman, L. A.
Pishchagin, V. V.
Konovalov, A. M.
Korneev, V. I.
Text and Data Mining valid from 2015-07-01
Version of Record valid from 2015-07-01
Article History
Received: 23 January 2015
First Online: 6 August 2015