Features of the Growth and Properties of Dielectric Layers and Metal−Insulator−Semiconductor Structures Obtained via the Anodic Oxidation of InAs in an Electrolyte Containing Fluorine Ions
Crossref DOI link: https://doi.org/10.1134/S1027451018020039
Published Online: 2018-04-25
Published Print: 2018-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Artamonov, A. V.
Astakhov, V. P.
Varlashov, I. B.
Mitasov, P. V.
Text and Data Mining valid from 2018-03-01
Article History
Received: 11 May 2017
First Online: 25 April 2018