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Comparative Analysis of the Effect of RF and DC Magnetron Sputtering Parameters on the Structure Formation of Tantalum-Diboride Thin Films

Crossref DOI link: https://doi.org/10.1134/S1027451018030291

Published Online: 2018-06-18

Published Print: 2018-05

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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