Method for Manufacturing Silicon X-Ray Masks Via Plasma Chemical Etching
Crossref DOI link: https://doi.org/10.1134/S1027451020040266
Published Online: 2020-08-25
Published Print: 2020-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Gentselev, A. N.
Dultsev, F. N.
Goldenberg, B. G.
Kuper, K. E.
Text and Data Mining valid from 2020-07-01
Version of Record valid from 2020-07-01
Article History
Received: 29 December 2019
Revised: 29 January 2020
Accepted: 31 January 2020
First Online: 25 August 2020