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Numerical Modeling of Thermal Processes and the Effect of Heating of Near-Surface Silicon Layers on the Titanium Accumulation and Diffusion during High-Intensity Pulsed Ion Implantation

Crossref DOI link: https://doi.org/10.1134/S1027451025701277

Published Online: 2025-11-15

Published Print: 2025-08

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Ivanova, A. I. https://orcid.org/0000-0001-7772-2878
Bleykher, G. A. https://orcid.org/0000-0001-5597-2569
Zaitsev, D. D. https://orcid.org/0009-0008-9445-0964
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Text and Data Mining valid from 2025-08-01

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Article History

Received: 10 March 2025

Revised: 22 April 2025

Accepted: 22 April 2025

First Online: 15 November 2025

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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