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The Dependence of the Elemental Composition of AlN Films on the Ratio of Argon and Nitrogen in a Plasma-Forming Gas Stream during Magnetron Sputtering of an Aluminum Target

Crossref DOI link: https://doi.org/10.1134/S1028335825600014

Published Online: 2025-07-03

Published Print: 2024-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Baisova, B. T.

Baranova, L. V.

Strunin, V. I.
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Text and Data Mining valid from 2024-12-01

Version of Record valid from 2024-12-01
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Article History

Received: 8 July 2024

Revised: 16 January 2025

Accepted: 16 January 2025

First Online: 3 July 2025

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflict of interest.

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