Dynamics of Deposition and Removal of a Fluorocarbon Film in the Cyclic Process of Plasma-Chemical Etching of Silicon
Crossref DOI link: https://doi.org/10.1134/S1062873823706050
Published Online: 2024-04-24
Published Print: 2024-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Morozov, O. V.
Text and Data Mining valid from 2024-04-01
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Article History
Received: 15 November 2023
Revised: 22 November 2023
Accepted: 28 December 2023
First Online: 24 April 2024
CONFLICT OF INTEREST
: The author of this work declares that he has no conflicts of interest.