Effect of polymer matrix and photoacid generator on the lithographic properties of chemically amplified photoresist
Crossref DOI link: https://doi.org/10.1134/S1063739714050023
Published Online: 2014-11-12
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bulgakova, S. A.
Gurova, D. A.
Zaitsev, S. D.
Kulikov, E. E.
Skorokhodov, E. V.
Toropov, M. N.
Pestov, A. E.
Chkhalo, N. I.
Salashchenko, N. N.
Text and Data Mining valid from 2014-11-01