Atomic Layer Deposition of Aluminum Nitride Using Tris(diethylamido)aluminum and Hydrazine or Ammonia
Crossref DOI link: https://doi.org/10.1134/S1063739718020026
Published Online: 2018-04-03
Published Print: 2018-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Abdulagatov, A. I.
Ramazanov, Sh. M.
Dallaev, R. S.
Murliev, E. K.
Palchaev, D. K.
Rabadanov, M. Kh.
Abdulagatov, I. M.
Text and Data Mining valid from 2018-03-01
Article History
Received: 14 August 2017
First Online: 3 April 2018