On the Effect of the Ratio of Concentrations of Fluorocarbon Components in a CF4 + C4F8 + Ar Mixture on the Parameters of Plasma and SiO2/Si Etching Selectivity
Crossref DOI link: https://doi.org/10.1134/S1063739718040030
Published Online: 2018-07-04
Published Print: 2018-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Efremov, A. M.
Murin, D. B.
Kwon, K.-H.
Text and Data Mining valid from 2018-07-01
Article History
Received: 15 November 2017
First Online: 4 July 2018