Nanosecond-Pulse Annealing of Heavily Doped Ge:Sb Layers on Ge Substrates
Crossref DOI link: https://doi.org/10.1134/S1063739718050025
Published Online: 2018-09-04
Published Print: 2018-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Batalov, R. I.
Bayazitov, R. M.
Novikov, H. A.
Faizrakhmanov, I. A.
Shustov, V. A.
Ivlev, G. D.
Text and Data Mining valid from 2018-09-01
Version of Record valid from 2018-09-01
Article History
Received: 16 January 2018
First Online: 4 September 2018