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Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension

Crossref DOI link: https://doi.org/10.1134/S1063739718050062

Published Online: 2018-09-04

Published Print: 2018-09

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Myakonkikh, A. V.

Kuvaev, K. Yu.

Tatarintsev, A. A.

Orlikovskii, N. A.

Rudenko, K. V.

Guschin, O. P.

Gornev, E. S.
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Article History

Received: 29 March 2018

First Online: 4 September 2018