Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching
Crossref DOI link: https://doi.org/10.1134/S1063739719010037
Published Online: 2019-04-22
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Derevyashkin, S. V.
Soboleva, E. A.
Shelkovnikov, V. V.
Malyshev, A. I.
Korolkov, V. P.
Text and Data Mining valid from 2019-01-01
Article History
Received: 27 July 2018
First Online: 22 April 2019