Etching of SiC in Low Power Inductively-Coupled Plasma
Crossref DOI link: https://doi.org/10.1134/S1063739719010074
Published Online: 2019-03-13
Published Print: 2018-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Osipov, A. A.
Aleksandrov, S. E.
Solov’ev, Yu. V.
Uvarov, A. A.
Text and Data Mining valid from 2018-11-01
Article History
Received: 14 June 2018
First Online: 13 March 2019