Atomic Layer Deposition of Silicon Nitride Films on Gallium Arsenide Using a Glow Discharge
Crossref DOI link: https://doi.org/10.1134/S1063739719030041
Published Online: 2019-07-19
Published Print: 2019-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ezhovskii, Yu. K.
Mikhailovskii, S. V.
Text and Data Mining valid from 2019-07-01
Version of Record valid from 2019-07-01
Article History
Received: 25 October 2018
Revised: 3 December 2018
Accepted: 16 December 2018
First Online: 19 July 2019