The Effect of an N2 Additive on the GaAs Etching Rate in CF2Cl2 Plasma
Crossref DOI link: https://doi.org/10.1134/S1063739719030089
Published Online: 2019-07-19
Published Print: 2019-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Pivovarenok, S. A.
Text and Data Mining valid from 2019-07-01
Version of Record valid from 2019-07-01
Article History
Received: 4 October 2018
Revised: 4 October 2018
Accepted: 4 October 2018
First Online: 19 July 2019