Crossmark

Application of Al2O3 Film for Stabilization of the Charge Properties of the SiO2/p-Si Interface

Published Online: 2024-03-05

Published Print: 2023-12

Authors

Kim, A. S.

Serko, N. A.

Khakuashev, P. E.

Kolky, A. N.

Yurchuck, S. Yu.
License Information

Text and Data Mining valid from 2023-12-01

Version of Record valid from 2023-12-01
More Information

Article History

Received: 26 February 2023

Revised: 17 March 2023

Accepted: 5 April 2023

First Online: 5 March 2024

CONFLICT OF INTEREST

: The authors declare that they have no conflicts of interest.

Document is current