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Concentration of Fluorine Atoms and Kinetics of Reactive-Ion Etching of Silicon in CF4 + O2, CHF3 + O2, and C4F8 + O2 Mixtures

Published Online: 2023-10-01

Published Print: 2023-08

Authors

Efremov, A. M.

Bobylev, A. V.

Kwon, K.-H.
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Text and Data Mining valid from 2023-08-01

Version of Record valid from 2023-08-01
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Article History

Received: 5 April 2023

Revised: 20 April 2023

Accepted: 22 April 2023

First Online: 1 October 2023

CONFLICT OF INTEREST

: The authors declare that they have no conflicts of interest.

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