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Plasma-Chemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium

Published Online: 2024-09-23

Published Print: 2024-08

Authors

Murin, D. B.

Chesnokov, I. A.

Gogulev, I. A.

Anokhin, A. L.

Moloskin, A. E.
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Text and Data Mining valid from 2024-08-01

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Article History

Received: 15 February 2024

Revised: 25 March 2024

Accepted: 25 March 2024

First Online: 23 September 2024

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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