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Plasma Parameters and Etching Kinetics of Si/SiO2 in Mixtures of Fluorocarbon Gases with Argon and Helium

Published Online: 2025-02-10

Published Print: 2024-12

Authors

Efremov, A. M.

Betelin, V. B.

Kwon, K.-H.
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Text and Data Mining valid from 2024-12-01

Version of Record valid from 2024-12-01
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Article History

Received: 1 July 2024

Revised: 20 September 2024

Accepted: 20 September 2024

First Online: 10 February 2025

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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