Structure of Thin Films of Titanium Nitride Formed by Magnetron Sputtering
Crossref DOI link: https://doi.org/10.1134/S1063739725600402
Published Online: 2025-08-31
Published Print: 2025-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Isaev, A. G.
Rogozhin, A. E.
Text and Data Mining valid from 2025-06-01
Version of Record valid from 2025-06-01
Article History
Received: 26 March 2025
Revised: 15 April 2025
Accepted: 15 April 2025
First Online: 31 August 2025
CONFLICT OF INTEREST
: The authors of this work declare that they have no conflicts of interest.