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Comprehensive Modeling of Line Edge Roughness and Line Width Roughness in Semiconductor Nanofabrication

Published Online: 2026-03-23

Published Print: 2025-12

Authors

Kulpinov, M. S.

Losev, V. V.

Krasyukov, A. Y.

Loseva, V. V.

Kalyonov, A. D.
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Text and Data Mining valid from 2025-12-01

Version of Record valid from 2025-12-01
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Article History

Received: 10 November 2025

Revised: 15 November 2025

Accepted: 15 November 2025

First Online: 23 March 2026

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.

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