High-Quality AlN Layers Grown on Si(111) Substrates by Metalorganic Chemical Vapor Deposition
Crossref DOI link: https://doi.org/10.1134/S1063774520010071
Published Online: 2020-03-25
Published Print: 2020-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ezubchenko, I. S.
Chernykh, M. Ya.
Mayboroda, I. O.
Trun’kin, I. N.
Chernykh, I. A.
Zanaveskin, M. L.
Text and Data Mining valid from 2020-01-01
Version of Record valid from 2020-01-01
Article History
Received: 19 November 2018
Revised: 27 November 2018
Accepted: 27 November 2018
First Online: 25 March 2020